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Method for inspecting electron emission uniformity of electron emitters in Large-sized Field Emission Device

机译:大型场发射装置中电子发射器电子发射均匀性的检验方法

摘要

A nanostructure including CNTs is used as an electron emission source, and the electron emission sources are arranged in a plurality of arrays on a cathode conductor, and a plurality of gates or lenses corresponding to the electron emission sources To a method for checking whether or not the electrons of the area field emission source device are uniformly emitted. In order to accomplish the above-described method, the present invention may include the steps of: scanning an electron beam to the electron emission source while the electron emission sources are arranged in a cathode conductor; Detecting electrons emitted from the electrons of the scanned electron beam striking the electron emission source or directly detecting electrons of the scanned electron beam at the electron emission source; And Checking uniformity of the amount of detected electrons or creating an image from the detected electrons to check uniformity of brightness; .
机译:将包含CNT的纳米结构用作电子发射源,并且将电子发射源以多个阵列布置在阴极导体上,以及与电子发射源相对应的多个栅极或透镜。区域场发射源装置的电子被均匀地发射。为了实现上述方法,本发明可以包括以下步骤:在电子发射源布置在阴极导体中的同时,扫描电子束到电子发射源;以及将电子束扫描到电子发射源。检测从撞击电子发射源的扫描电子束的电子发射的电子,或直接在电子发射源处检测扫描电子束的电子;并且检查所检测的电子的量的均匀性或从所检测的电子产生图像以检查亮度的均匀性; 。

著录项

  • 公开/公告号KR101720697B1

    专利类型

  • 公开/公告日2017-04-03

    原文格式PDF

  • 申请/专利权人 씨이비티 주식회사;

    申请/专利号KR20160085347

  • 发明设计人 김 호 섭;

    申请日2016-07-06

  • 分类号H01J9/42;H01J1/30;

  • 国家 KR

  • 入库时间 2022-08-21 13:25:46

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