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METHOD OF PRODUCING BAND GAP IN GRAPHENE USING CS+ IONS AND GRAPHENE WITH A BAND GAP THEREFROM

机译:CS +离子和石墨烯在带隙中制备石墨烯带隙的方法

摘要

The present invention relates to a technique for forming a band gap of 0.1 eV or more and 0.68 eV or less necessary for adsorbing cesium ions of low energy on graphene to apply the graphene to a semiconductor material and finely adjusting the size thereof through neutral cesium atom adsorption To a method capable of sufficiently stably forming a graphen having an ON state and an OFF state as channel materials which are essential for using an electronic device and a bandgap retaining graphen fabricated therefrom. The present invention also relates to a method for measuring the total size of such a band gap and a method for confirming adsorption amount of adsorbed cesium ions or neutral cesium.;
机译:技术领域本发明涉及一种形成在石墨烯上吸附低能量的铯离子以将石墨烯施加至半导体材料并通过中性铯原子精细调节其尺寸所需的0.1eV以上且0.68eV以下的带隙的技术。吸附是一种能够充分稳定地形成具有导通状态和截止状态的石墨烯作为沟道材料的方法,这对于使用电子器件和由其制造的带隙保持石墨烯是必不可少的。本发明还涉及一种用于测量这种带隙的总尺寸的方法以及一种用于确定所吸附的铯离子或中性铯的吸附量的方法。

著录项

  • 公开/公告号KR101726735B1

    专利类型

  • 公开/公告日2017-04-13

    原文格式PDF

  • 申请/专利权人 포항공과대학교 산학협력단;

    申请/专利号KR20150026596

  • 发明设计人 성시진;정진욱;

    申请日2015-02-25

  • 分类号C01B31/04;

  • 国家 KR

  • 入库时间 2022-08-21 13:25:41

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