FOCUS TEST MASK FOCUS MEASURING METHOD EXPOSURE APPARATUS AND EXPOSURE METHOD

摘要

The focus test reticle for measuring focus information has a line pattern formed by a light shielding film having an outer pattern and an outer pattern extending in the Y direction and a phase shift formed on the + X direction side of the line pattern and having a line width narrower than the line pattern X direction side of the line pattern and has a line width narrower than the line pattern; a transmission section formed on the + X direction side of the phase shift section; and a phase shift section formed on the -X direction side of the transmission section. The focus information of the projection optical system can be measured with high measurement reproducibility and with high measurement efficiency.