A method for controlling a mis - structure design in a tft and system for carrying out the method

摘要

In the present case, a method for controlling a mis - structure design in a tft and a system for carrying out the method disclosed. The method comprises the steps of: determining the dielectric constant of silicon nitride in the mis - structure, such as by calculation is carried out; and deciding whether the dielectric constant of silicon nitride, a target value in a tft - production process is achieved, wherein, when a negative decision result is determined, parameters of the mis - structure is to be set, in order to make it possible for the dielectric constant of silicon nitride in the mis - a structure according to the setting the desired value is reached in the tft - production method. A mis - structural design can effectively be controlled, as a result of which the output and stability of tft - lcd - products are improved.