首页> 外国专利> RUTHENIUM ACID BISMUTH PARTICLE CONTAINING GLASS, METHOD FOR MANUFACTURING THE SAME, THICK FILM RESISTOR COMPOSITION AND THICK FILM RESISTOR PASTE

RUTHENIUM ACID BISMUTH PARTICLE CONTAINING GLASS, METHOD FOR MANUFACTURING THE SAME, THICK FILM RESISTOR COMPOSITION AND THICK FILM RESISTOR PASTE

机译:含玻璃的钌酸铋粉体,其制造方法,厚膜电阻剂组合物和厚膜电阻膏

摘要

PROBLEM TO BE SOLVED: To provide ruthenium acid bismuth containing glass obtained by depositing ruthenium acid bismuth having a crystallite diameter of 20-100 nm in lead-free glass frit as a conductive material for thick film resistors; a method for manufacturing the same; a lead-free resistor composition using a powder of the glass; and thick film resistor paste using the thick film resistor composition.;SOLUTION: In the ruthenium acid bismuth containing glass, ruthenium acid bismuth particles shown by the general formula (Bi2+XRu2O7+Y, where X=-0.13 to 0 and Y=-0.5 to +0.4) exists in the glass. The half-value width of (111) planes of the ruthenium acid bismuth particles by the X-ray diffraction measurement of the glass is in a range of 0.16-0.48°, and a crystallite diameter required from the half-value width is 20-100 nm.;SELECTED DRAWING: None;COPYRIGHT: (C)2019,JPO&INPIT
机译:解决的问题:提供一种含钌酸铋的玻璃,该玻璃是通过在无铅玻璃粉中沉积微晶直径为20-100 nm的钌酸铋作为厚膜电阻器的导电材料而制得的;一种制造方法;使用玻璃粉末的无铅电阻器组合物;解决方案:在含钌酸铋的玻璃中,通式为(Bi 2 + X Ru 2 < / Sub> O 7 + Y ,其中X = -0.13到0,Y = -0.5到+0.4)。通过玻璃的X射线衍射测量,钌酸铋颗粒的(111)面的半值宽度在0.16-0.48°的范围内,并且从该半值宽度所需的微晶直径为20-。 100 nm .;选定的图纸:无;版权所有:(C)2019,JPO&INPIT

著录项

  • 公开/公告号JP2018165222A

    专利类型

  • 公开/公告日2018-10-25

    原文格式PDF

  • 申请/专利权人 SUMITOMO METAL MINING CO LTD;

    申请/专利号JP20170062171

  • 发明设计人 ISHIYAMA NAOKI;

    申请日2017-03-28

  • 分类号C03C10/02;C01G55/00;C03C8/16;C03B32/02;H01C17/065;H01B5/16;H01B13/00;H01B1/16;H01B1/22;

  • 国家 JP

  • 入库时间 2022-08-21 13:14:11

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