RAW MATERIAL FOR CHEMICAL VAPOR DEPOSITION, PRODUCTION METHOD THEREOF, AND PRODUCTION METHOD OF OXIDE FILM CONTAINING INDIUM FORMED BY USING RAW MATERIAL FOR CHEMICAL VAPOR DEPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a raw material for chemical vapor deposition (CVD), preservable for a long term, and easily handleable when performing CVD, which is a raw material for producing an indium oxide thin film by CVD; and to provide a production method thereof.;SOLUTION: A raw material for chemical vapor deposition contains a compound expressed as following formula (1), and has an absorption peak in a region of 500 nm or higher and 700 nm or lower in a visible light region (in the formula (1), R shows an alkyl group having the number of carbon atoms of 1-4).;SELECTED DRAWING: None;COPYRIGHT: (C)2018,JPO&INPIT