INDIUM ELECTROPLATING COMPOSITION CONTAINING 1,10-PHENANTHROLINE COMPOUND, AND METHOD FOR ELECTROPLATING INDIUM

摘要

PROBLEM TO BE SOLVED: To provide an indium electroplating composition which can be used to electroplate indium metal on metal layers of various substrates such as a semiconductor waver and a thermal conductive material, does not substantially have a defect, and has a uniform and smooth surface morphology.;SOLUTION: The indium electroplating composition is provided that contains a trace amount of a 1,10-phenanthroline compound represented by formula (I). In formula (I), R₁ to R₈ are each independently H, straight chain/branched C₁ to ₅ alkyl, OH, straight chain/branched hydroxy C₁ to ₅ alkyl, NO₂, substituted/non-substituted phenyl, straight chain/branched C₁ to ₅ alkoxy, carboxyl, aldehyde, amino or primary to tertiary amino C₁ to ₅ alkyl.;SELECTED DRAWING: None;COPYRIGHT: (C)2018,JPO&INPIT