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INDIUM ELECTROPLATING COMPOSITIONS CONTAINING 1,10-PHENANTHROLINE COMPOUNDS AND METHODS OF ELECTROPLATING INDIUM

机译:包含1,10-菲咯啉化合物的铟电镀组合物和电镀铟的方法

摘要

Indium electroplating compositions containing 1,10-phenanthroline compounds in trace amounts to electroplate substantially defect-free uniform and smooth surface morphology indium on metal layers. The indium electroplating compositions can be used to electroplate indium metal on metal layers of various substrates such as semiconductor wafers and as thermal interface materials.
机译:含有痕量的1,10-菲咯啉化合物的铟电镀组合物,在金属层上电镀基本上无缺陷的均匀且光滑的表面形态铟。铟电镀组合物可用于将铟金属电镀在诸如半导体晶片的各种基底的金属层上并用作热界面材料。

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