Fabrication of nanostructured substrates containing multiple nanostructure gradients on a single substrate

摘要

The present invention relates to a method of manufacturing a nanostructured substrate comprising an array of protruding nanostructures. The method comprises at least a) providing a main substrate and b) depositing on the main substrate at least one layer of material removable by reactive ion etch (RIE) and including a predetermined thickness gradient. C) depositing a nanostructured etch mask on the gradient layer deposited in step b); d) forming a protrusion structure, particularly a nanopillar, on the gradient layer deposited in step b) by RIE; Forming at least two, preferably three predetermined continuous gradients of the geometry parameters on the same substrate. Specifically, the geometry parameter is selected from the group including the height, diameter and spacing of the protrusion structure. Another aspect of the invention relates to a nanostructured substrate comprising an array of protruding nanostructures obtainable by the method outlined above. In a preferred embodiment of the nanostructured substrate, each of the protruding nanostructures simultaneously represents three continuous gradient elements of the protruding nanostructure height, diameter, and spacing. [Selection] Figure 5