首页> 外国专利> Substrate for imprint mold, imprint mold and production method thereof, and evaluation method for imprint mold base material

Substrate for imprint mold, imprint mold and production method thereof, and evaluation method for imprint mold base material

机译:压印模具用基板,压印模具及其制造方法以及压印模具基材的评价方法

摘要

PROBLEM TO BE SOLVED: To provide a base material for an imprint mold capable of preventing a magnification ratio of a fine projecting and recessing pattern from exceeding a desired range, and an imprint mold obtained by using the base material for an imprint mold.SOLUTION: A base material 1 for an imprint mold includes a base 2 having a first surface 2a and a second surface 2b facing the first surface 2a. A concavity 4 is formed at approximately the center on the second surface 2b side as plan view, and a recessed portion having a projecting and recessing volume of a reference volume or more is not present within a region around the concavity 4 on the second surface 2b side.
机译:解决的问题:提供一种能够防止精细的凹凸图案的放大率超过期望范围的压印模具的基材,以及通过使用该压印模具的基材而获得的压印模具。用于压印模具的基材1包括具有第一表面2a和面对第一表面2a的第二表面2b的基材2。在俯视时,在第二面2b侧的大致中央处形成有凹部4,在第二面2b的凹部4的周围的区域内不存在具有基准体积以上的凹凸量的凹部。侧。

著录项

  • 公开/公告号JP6375718B2

    专利类型

  • 公开/公告日2018-08-22

    原文格式PDF

  • 申请/专利权人 大日本印刷株式会社;

    申请/专利号JP20140129148

  • 发明设计人 吉田 幸司;

    申请日2014-06-24

  • 分类号H01L21/027;B29C59/02;

  • 国家 JP

  • 入库时间 2022-08-21 13:10:37

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