Indirect surface cleaning apparatus and method

摘要

At least one feature is provided on the photomask. At least one feature has an associated design location, and the distance between the at least one feature location and the associated design location is an error in the location of the at least one feature. Produce. A method for improving the performance characteristics of a photomask includes directing electromagnetic radiation toward the photomask, the electromagnetic radiation having a wavelength substantially consistent with a high absorption coefficient of the photomask, the method comprising: The method further includes generating an increase in thermal energy in the photomask due to incidence of electromagnetic radiation on the photomask, and reducing a positional error as a result of the occurrence of an increase in thermal energy in the photomask.