Sulfonic acid derivative compounds as photoacid generators in resist applications

摘要

Novel photoacid generator compounds are provided. Also provided are photoresist compositions comprising the novel photoacid generator compounds. The present invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for a variety of microfabrication applications. [Selection] Figure 4