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High reflection film, substrate with high reflection film and method for manufacturing high reflection film

机译:高反射膜,具有高反射膜的基板以及高反射膜的制造方法

摘要

PROBLEM TO BE SOLVED: To provide; a high reflective film which offers improved adhesion between a silver film and a film formed on a substrate side thereof or a side opposite the substrate side and prevention of sulfurization and migration of the silver film; a substrate having the same; and a manufacturing method for the same.SOLUTION: A high reflective film comprises a sliver film 30 formed on a substrate 10, and a dielectric multilayer film 40 formed on and in contact with the silver film 30. The dielectric multilayer film 40 comprises an inorganic dielectric film(s) 40b having a low refractive index and inorganic dielectric film(s) 40a having a high refractive index alternately laminated to form at least two layers. A layer of the dielectric multilayer film 40 next to the silver film 30 is the inorganic dielectric film 40b having a low refractive index, which is mainly made of SiOand contains ZnO.
机译:要解决的问题:提供;一种高反射膜,它改善了银膜与在其衬底侧或与衬底侧相对的一侧上形成的膜之间的粘附性,并防止了银膜的硫化和迁移。具有该基板的基板;解决方案:高反射膜包括形成在基板10上的条状膜30和形成在银膜30上并与之接触的介电多层膜40。介电多层膜40包括无机物。具有低折射率的电介质膜40b和具有高折射率的无机电介质膜40a交替地层叠以形成至少两层。与银膜30相邻的电介质多层膜40的层是具有低折射率的无机电介质膜40b,其主要由SiO制成并且包含ZnO。

著录项

  • 公开/公告号JP6302688B2

    专利类型

  • 公开/公告日2018-03-28

    原文格式PDF

  • 申请/专利权人 ジオマテック株式会社;

    申请/专利号JP20140018279

  • 发明设计人 伊東 孝洋;

    申请日2014-02-03

  • 分类号G02B5/08;

  • 国家 JP

  • 入库时间 2022-08-21 13:07:38

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