Method for regenerating glass substrate, method for manufacturing regenerated glass substrate, and method for manufacturing photomask

摘要

The present invention relates to a reprocessing method for remaking as a new photo mask glass substrate either a photo mask which is used up in each type of flat panel manufacturing or a photo mask which is rendered defective in a photo mask fabrication process, as well as a photo mask glass substrate which is remade in this reprocessing method, and a blank mask and photo mask used therein. The method allows obtaining a remade glass substrate with few defects and at low cost, by a process which makes wettability uniform such that traces of an original pattern do no appear in breath figure inspection, without carrying out a conventional physical polishing process upon the surface of the remade glass substrate.