首页> 外国专利> Mask position adjustment method of ion milling, electron microscope capable of adjusting mask position, mask adjustment device mounted on sample stage, and sample mask part of ion milling device

Mask position adjustment method of ion milling, electron microscope capable of adjusting mask position, mask adjustment device mounted on sample stage, and sample mask part of ion milling device

机译:离子铣削的掩模位置调整方法,能够调整掩模位置的电子显微镜,安装在样品台上的掩模调整装置以及离子铣削装置的样品掩模部分

摘要

Without providing a heat source in the electron microscope, the mask position is adjusted with high accuracy while observing with the electron microscope. A sample mask part (21) capable of adjusting a positional relationship between a sample (3) and a mask (2) in an ion milling mask position adjustment method is positioned on a sample stage of an electron microscope and a mask of a sample mask part (21) The position adjuster (26) is connected to the R axis (113) of the sample stage on the previous stage so that the position of the mask (2) can be adjusted by driving the R axis (113). While observing with the electron microscope, Drive the R axis (113) to adjust the position of the mask (2).
机译:在电子显微镜中不提供热源的情况下,一边用电子显微镜观察,一边高精度地调整掩模位置。在离子显微镜掩模的位置调整方法中,能够调整样品(3)与掩模(2)之间的位置关系的样品掩模部(21)位于电子显微镜的样品台和样品掩模的掩模上。部件(21)位置调节器(26)连接到前一个样品台的R轴(113),从而可以通过驱动R轴(113)来调节掩模(2)的位置。用电子显微镜观察时,驱动R轴(113)调整遮罩(2)的位置。

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