首页> 外国专利> Mask Position Adjustment Method of Ion Milling, Electron Microscope Capable of Adjusting Mask Position, Mask Adjustment Device Mounted on Sample Stage and Sample Mask Component of Ion Milling Device

Mask Position Adjustment Method of Ion Milling, Electron Microscope Capable of Adjusting Mask Position, Mask Adjustment Device Mounted on Sample Stage and Sample Mask Component of Ion Milling Device

机译:离子铣削的掩模位置调整方法,能够调整掩模位置的电子显微镜,安装在样品台上的掩模调整装置以及离子铣削装置的样品掩模部件

摘要

The present invention relates to adjustment of a mask position by driving an R-axis of an electron microscope in order to adjust the mask position with high accuracy while performing observation by the electron microscope without providing a heat generation source inside the electron microscope. The R-axis originally exists in a sample chamber of the electron microscope, which enables control with high accuracy. The R-axis driving of a sample stage can be substituted by raster rotation, therefore, the mask position can be adjusted with high accuracy while performing observation by the electron microscope according to the present invention.
机译:本发明涉及通过驱动电子显微镜的R轴来调节掩模位置,以便在不通过在电子显微镜内部设置发热源的情况下在通过电子显微镜进行观察的同时高精度地调节掩模位置。 R轴最初存在于电子显微镜的样品室中,因此可以进行高精度控制。可以通过光栅旋转来代替样品台的R轴驱动,因此,在通过根据本发明的电子显微镜进行观察的同时,可以高精度地调整掩模位置。

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