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Mask position adjustment method of ion milling, electron microscope capable of adjusting mask position, mask adjustment device mounted on sample stage and sample mask component of ion milling device
Mask position adjustment method of ion milling, electron microscope capable of adjusting mask position, mask adjustment device mounted on sample stage and sample mask component of ion milling device
The present invention relates to adjustment of a mask position by driving an R-axis of an electron microscope in order to adjust the mask position with high accuracy while performing observation by the electron microscope without providing a heat generation source inside the electron microscope. The R-axis originally exists in a sample chamber of the electron microscope, which enables control with high accuracy. The R-axis driving of a sample stage can be substituted by raster rotation, therefore, the mask position can be adjusted with high accuracy while performing observation by the electron microscope according to the present invention.
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