首页> 外国专利> Cylindrical ceramics sputtering target material and cylindrical ceramics sputtering target constructed by joining one or more cylindrical ceramics sputtering target material to a backing tube

Cylindrical ceramics sputtering target material and cylindrical ceramics sputtering target constructed by joining one or more cylindrical ceramics sputtering target material to a backing tube

机译:圆柱形陶瓷溅射靶材料和通过将一种或多种圆柱形陶瓷溅射靶材料结合到衬管上而构成的圆柱形陶瓷溅射靶

摘要

The purpose of the present invention is to suppress the occurrence of arcing, nodules, and cracks that could not be prevented by simply setting various bulk properties (crystal grain size, relative density, conductivity, etc.) individually within a suitable range. It is an object of the present invention to provide a cylindrical ceramics-based sputtering target material and a cylindrical ceramics-based sputtering target obtained by joining the material to a backing tube. In the cylindrical ceramic sputtering target material, in the region divided into four in the axial direction of the target, for each of the four divided regions, 0 °, 90 °, 180 ° and 270 in the circumferential direction in the further divided region. When the regions are divided at intervals of ° and the color difference ΔE * ab is measured in each region, a cylindrical ceramic sputtering target material having a color difference ΔE * ab of less than 1.0 is provided.
机译:本发明的目的是通过简单地将各种体积性质(晶粒尺寸,相对密度,电导率等)分别简单地设置在合适的范围内来抑制不能防止的电弧,小瘤和裂纹的发生。本发明的一个目的是提供一种圆柱形的陶瓷基溅射靶材料和一种通过将材料结合到衬管上而获得的圆柱形的陶瓷基溅射靶。在圆筒形陶瓷溅射靶材中,在靶的轴向上被分为四个的区域中,对于四个被划分的区域中的每个,在进一步被划分的区域中在周向上分别为0°,90°,180°和270。当以°的间隔划分区域并且在每个区域中测量色差ΔE* ab时,提供了色差ΔE* ab小于1.0的圆筒形陶瓷溅射靶材料。

著录项

  • 公开/公告号JPWO2017131111A1

    专利类型

  • 公开/公告日2018-02-01

    原文格式PDF

  • 申请/专利权人 JX金属株式会社;

    申请/专利号JP20170551360

  • 发明设计人 館野 諭;

    申请日2017-01-26

  • 分类号C23C14/34;C04B35/01;

  • 国家 JP

  • 入库时间 2022-08-21 13:06:26

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