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Doping engineered hole transport layer for perovskite-based device

机译:用于钙钛矿基器件的掺杂工程空穴传输层

摘要

An optoelectronic device is provided, the device comprising an active layer comprising organometal halide perovskite and a hole transport layer (HTL) formed by vacuum evaporation and configured to transport hole carriers. The HTL includes a first sublayer comprising a hole transport material (HTM) doped with an n-dopant and disposed adjacent to the active layer, a second sublayer comprising the HTM that is undoped and disposed adjacent to the first sublayer, and a third sublayer comprising the HTM doped with a p-dopant and disposed adjacent to the second sublayer. The doping concentration of the n-dopant for the n-doped sublayer is determined to match the highest occupied molecular orbital energy level of the n-doped sublayer with the valence band maximum energy level of the perovskite active layer.
机译:提供了一种光电器件,该器件包括包含有机金属卤化物钙钛矿的活性层和通过真空蒸发形成并配置为传输空穴载体的空穴传输层(HTL)。该HTL包括第一子层和第三子层,该第一子层包括掺杂有n-掺杂剂并与有源层相邻的空穴传输材料(HTM),第二子层和第二子层,该空穴不掺杂并与第一子层相邻地设置。 HTM掺杂有p型掺杂剂,并与第二子层相邻。确定n掺杂子层的n掺杂剂的掺杂浓度,以使n掺杂子层的最高占据分子轨道能级与钙钛矿活性层的价带最大能级相匹配。

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