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Method of Depositing Niobium Doped Titania Film on a Substrate and the Coated Substrate Made Thereby
Method of Depositing Niobium Doped Titania Film on a Substrate and the Coated Substrate Made Thereby
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机译:在基板上沉积掺杂铌的二氧化钛膜的方法以及由此制成的涂覆基板
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摘要
A coated article includes an applied transparent electrically conductive oxide film of niobium doped titanium oxide. The article can be made by using a coating mixture having a niobium precursor and a titanium precursor. The coating mixture is directed toward a heated substrate to decompose the coating mixture and to deposit a transparent electrically conductive niobium doped titanium oxide film on the surface of the heated substrate. In another coating process, the mixed precursors are moved toward the substrate positioned in a plasma area between spaced electrodes to coat the surface of the substrate. Optionally, the substrate can be heated or maintained at room temperature. The deposited niobium doped titanium oxide film has a sheet resistance greater than 1.2 ohms/square and an index of refraction of 1.00 or greater. The chemical formula for the niobium doped titanium oxide is Nb:TiOx where X is in the range of 1.8-2.1.
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机译:涂层制品包括涂覆的掺杂铌的二氧化钛的透明导电氧化物膜。可以通过使用具有铌前体和钛前体的涂料混合物来制造该制品。将涂料混合物引向加热的基材,以分解涂料混合物并在加热的基材的表面上沉积透明的掺杂铌的导电氧化钛薄膜。在另一涂覆过程中,将混合的前体移向位于间隔开的电极之间的等离子体区域中的衬底以涂覆衬底的表面。可选地,可以将基板加热或保持在室温下。沉积的掺杂铌的二氧化钛膜的薄层电阻大于1.2欧姆/平方,并且折射率为1.00或更大。铌掺杂的二氧化钛的化学式为Nb:TiO x Sub>,其中X在1.8-2.1的范围内。
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