首页> 外国专利> Self-rectifying RRAM cell structure having two resistive switching layers with different bandgaps and RRAM 3D crossbar array architecture

Self-rectifying RRAM cell structure having two resistive switching layers with different bandgaps and RRAM 3D crossbar array architecture

机译:具有两个带隙不同的电阻切换层和RRAM 3D交叉开关阵列结构的自整流RRAM单元结构

摘要

The present disclosure provides a self-rectifying RRAM cell structure including a first electrode layer formed of a nitride of a first metal element, a second electrode layer formed of a second metal element that is different from the first metal element, a first resistive switching layer and a second resistive switching layer. The first resistive switching layer is sandwiched between the first electrode layer and the second resistive switching layer, and the second resistive switching layer is sandwiched between the first resistive switching layer and the second electrode layer. The first resistive switching layer has a first bandgap that is lower than the second bandgap of the second resistive switching layer. Furthermore, a RRAM 3D crossbar array architecture is also provided.
机译:本公开提供了一种自整流RRAM单元结构,其包括:由第一金属元素的氮化物形成的第一电极层;由与第一金属元素不同的第二金属元素形成的第二电极层;第一电阻性开关层第二电阻开关层。第一电阻切换层被夹在第一电极层与第二电阻切换层之间,第二电阻切换层被夹在第一电阻切换层与第二电极层之间。第一电阻切换层具有比第二电阻切换层的第二带隙低的第一带隙。此外,还提供了RRAM 3D交叉开关阵列架构。

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