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Silicon germanium thickness and composition determination using combined XPS and XRF technologies
Silicon germanium thickness and composition determination using combined XPS and XRF technologies
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机译:结合使用XPS和XRF技术确定硅锗的厚度和成分
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摘要
Systems and approaches for silicon germanium thickness and composition determination using combined XPS and XRF technologies are described. In an example, a method for characterizing a silicon germanium film includes generating an X-ray beam. A sample is positioned in a pathway of said X-ray beam. An X-ray photoelectron spectroscopy (XPS) signal generated by bombarding said sample with said X-ray beam is collected. An X-ray fluorescence (XRF) signal generated by bombarding said sample with said X-ray beam is also collected. Thickness or composition, or both, of the silicon germanium film is determined from the XRF signal or the XPS signal, or both.
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