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Maskless exposure method and a maskless exposure device for performing the exposure method

机译:无掩模曝光方法和用于执行该曝光方法的无掩模曝光装置

摘要

A maskless exposure device includes a stage on which a substrate is disposed, an optical head, and an optical source part. The optical head irradiates light to the substrate. The light source part provides the optical head with a light. The optical head irradiates the light, according to an average-focus distance, to the substrate. The average-focus distance is determined by averaging best-focus distances for a plurality of regions of the substrate, respectively.
机译:无掩模曝光装置包括其上布置基板的台架,光学头和光源部分。光学头将光照射到基板。光源部分为光学头提供光。光学头根据平均聚焦距离将光照射到基板上。通过分别平均基板的多个区域的最佳聚焦距离来确定平均聚焦距离。

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