MASKLESS EXPOSURE DEVICE, MASKLESS EXPOSURE METHOD AND DISPLAY SUBSTRATE MANUFACTURED BY MASKLESS EXPOSURE DEVICE AND MASKLESS EXPOSURE METHOD

摘要

A maskless exposure device includes: an exposure head including a digital micro-mirror device (DMD) which reflects a source beam provided from an exposure source in a substrate to scan exposure beams on the substrate; and a system control part which controls the DMD by using a graphic data system (GDS) file. The pattern of a direction parallel to the scan direction of the exposure head of the pattern of the graphic data system file, includes a first pattern part having a wider width than a target width, and a second pattern part which is alternately arranged with the first pattern part and has a smaller width than the target width. So, the failure of a display device can be reduced.;COPYRIGHT KIPO 2016