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GROUP III - NITRIDE STRUCTURE HAVING SUCCESSIVELY REDUCED CRYSTALLOGRAPHIC DISLOCATION DENSITY REGIONS

机译:第三类-氮化物结构成功降低的晶体位移密度区域

摘要

A structure having: a nucleation layer; and a Group III-Nitride structure disposed on a surface of the nucleation layer, the Group III-Nitride structure comprising a plurality of pairs of stacked Group III-Nitride layers, each one of the pairs of layers having a lower layer having a 3D growth structure and each one of the upper one of the pairs of layers having a 2D growth structure. Each one of the lower layers at completion has a surface roughness greater than a surface roughness at completion of an upper one of the pair of layers. Interfaces between each one of the upper layers and each one of the lower layers of the plurality of pairs of stacked Group III-Nitride layers have crystallographic dislocation combinations and/or annihilations therein.
机译:一种结构,具有:成核层;以及设置在成核层的表面上的III族-氮化物结构,该III族-氮化物结构包括多对堆叠的III族-氮化物层对,每对层具有具有3D生长的下层。一对层中的每一个具有2D生长结构。下部层中的每个完成时的表面粗糙度均大于一对层中的上层中的一个完成时的表面粗糙度。多对堆叠的III族-氮化物层对中的上层的每一层和下层的每一层之间的界面在其中具有晶体位错组合和/或hil灭。

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