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Group III-nitride structures with successively reduced crystallographic dislocation density regions

机译:III族氮化物结构,晶体位错密度区域依次减小

摘要

A nucleation layer; And a group III-nitride structure disposed on the surface of the nucleation layer, wherein the group III-nitride structure comprises a plurality of pairs of stacked Group III-nitride layers, each of the plurality of pairs. Has a lower layer having a 3D growth structure, and each of the upper layers of the plurality of pairs has a 2D growth structure. Each of the bottom layers upon completion has a surface roughness that is greater than the surface roughness upon completion of the top layer of the pair of layers. The interface between each of the upper and lower layers of the plurality of pairs of stacked Group III-nitride layers has crystallographic potential combination and / or dissipation therein.
机译:成核层;以及布置在成核层的表面上的III族氮化物结构,其中III族氮化物结构包括多对堆叠的III族氮化物层的叠层,所述多对叠层中的每对。具有具有3D生长结构的下层,并且多对的每个上层具有2D生长结构。完成时每个底层的表面粗糙度都大于成对的顶层中完成时的表面粗糙度。多个成对的堆叠的III族氮化物层对的上层和下层中的每一个之间的界面在其中具有晶体学电势组合和/或耗散。

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