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Processing techniques for silicon-based transient devices

机译:基于硅的瞬态器件的处理技术

摘要

Provided are methods of making a transient electronic device by fabricating one or more inorganic semiconductor components, one or more metallic conductor components or one or more inorganic semiconductor components and one or more metallic conductor components supported by a mother substrate. The components may independently comprise a selectively transformable material and, optionally, further have a preselected transience profile. The components are transfer printed, thereby decoupling the component fabrication step from additional processing to provide desired device functionality and transient properties. A substrate layer is provided on top of the components and used to facilitate handling, processing, and/or device functionality.
机译:提供了通过制造一种或多种无机半导体部件,一种或多种金属导体部件或一种或多种无机半导体部件以及一种或多种由母体基板支撑的金属导体部件来制造瞬态电子器件的方法。组件可以独立地包括可选择性变形的材料,并且可选地,还具有预选的瞬态轮廓。部件被转印,从而使部件制造步骤与附加处理脱钩,以提供所需的器件功能和瞬态特性。衬底层设置在组件的顶部,用于促进处理,处理和/或设备功能。

著录项

  • 公开/公告号US9875974B2

    专利类型

  • 公开/公告日2018-01-23

    原文格式PDF

  • 申请/专利号US201414772354

  • 发明设计人 JOHN A. ROGERS;SUKWON HWANG;XIAN HUANG;

    申请日2014-03-06

  • 分类号H01L21;H01L23;H01L21/8238;H01L21/28;H01L21/306;H01L21/56;H01L21/683;H01L21/768;H01L21/78;H01L21/84;H01L23/532;H01L25/065;H01L25/16;H01L25;G01N27/22;

  • 国家 US

  • 入库时间 2022-08-21 12:56:02

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