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Metrology apparatus for a semiconductor pattern, metrology system including the same and metrology method using the same
Metrology apparatus for a semiconductor pattern, metrology system including the same and metrology method using the same
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机译:用于半导体图案的计量设备,包括该计量设备的计量系统以及使用该计量系统的计量方法
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摘要
A metrology method includes obtaining a pattern reflection light reflected from an object by irradiating a first divided light, which is generated by reflecting a polarized light, to the object; obtaining a phase-controlled mirror reflection light reflected from a reflector by irradiating a second divided light, which is generated by transmitting the polarized light, to the reflector; and obtaining a pattern of the object based on an interference signal between the pattern reflection light and the mirror reflection light.
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