首页> 外国专利> SUBSTRATE EQUIPPED WITH THIN-LAYER SYSTEM WITH THERMAL PROPERTIES CONTAINING THE LAST METAL LAYER AND PRECONDITIONAL OXIDATIVE LAYER

SUBSTRATE EQUIPPED WITH THIN-LAYER SYSTEM WITH THERMAL PROPERTIES CONTAINING THE LAST METAL LAYER AND PRECONDITIONAL OXIDATIVE LAYER

机译:装有具有最后金属层和前提氧化层的热特性的薄层系统的基质

摘要

The invention relates to a substrate (30) coated on one side (29) with a thin-layer system (14) containing at least one metallic functional layer (140), and this system contains, first, the last layer (168), which is a layer system, the most remote from the specified side (29), which contains at least one metal M, moreover, the specified metal is a reducing oxide / metal pair having a redox potential γ, and the last layer (168) is in the metallic state, and tue The second to last layer (167), which is a layer of the system, is directly under and in contact with the specified last layer (168) in the direction of the specified side (29), which contains at least one metal M / metal having a redox potential γ, and the said penultimate layer (167) is at least in a partially oxidized state, characterized in that said redox potential γ is larger than the indicated redox state the setting potential of γ.
机译:本发明涉及在一侧(29)上涂覆有包含至少一个金属功能层(140)的薄层系统(14)的基底(30),并且该系统首先包含最后一层(168),层系统是最远离指定面(29)的层系统,其中至少包含一种金属M,此外,指定金属是具有氧化还原电势γ的还原性氧化物/金属对,最后一层(168)处于金属状态,周二第二至最后一层(167)是系统的一层,在指定侧面(29)的方向上直接位于指定的最后一层(168)之下并与之接触,所述倒数第二层(167)至少含有部分具有氧化还原电势γ的金属M /金属,并且所述倒数第二层(167)至少处于部分氧化态,其特征在于,所述氧化还原电势γ大于所示的氧化还原态。 γ。

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