首页> 外国专利> Holder for receiving and protecting one side of a photomask or of a photomask with pellicle from a cleaning medium, method for cleaning a photomask or a photomask with pellicle and apparatus for opening and closing a holder

Holder for receiving and protecting one side of a photomask or of a photomask with pellicle from a cleaning medium, method for cleaning a photomask or a photomask with pellicle and apparatus for opening and closing a holder

机译:用于从清洁介质接收和保护光罩或带有防护膜的光罩的一侧的支架,用于用防护膜清洁光罩或光罩的方法以及用于打开和关闭支架的装置

摘要

A holder for receiving and protecting one side of a photomask or a photomask with pellicle from a cleaning medium, a method for cleaning such a photomask and an apparatus for opening and closing a holder. The holder comprises a base having support elements for receiving and holding the photomask or the photomask with pellicle spaced from the bottom surface of the base, and a sealing frame having an upper and a lower side and a center opening, sized for receiving the photomask in a spaced manner. A circumferential, elastic sealing element on the sealing frame extends into the center opening in an inclined manner towards the upper side of the sealing frame. The sealing element, in a no load condition, has an inner circumference which is narrower than the outer circumference of the photomask, and in a load condition circumferentially contacts a photomask in the center opening.
机译:用于从清洁介质接收和保护光掩模或带有防护膜的光掩模的一侧的支架,用于清洁这种光掩模的方法以及用于打开和关闭支架的设备。保持器包括:基座,其具有用于容纳和保持光掩模或薄膜与基座的底面间隔开的支撑元件;以及密封框架,其具有上侧和下侧以及中心开口,其尺寸适于将光掩模容纳在其中。隔开。密封框架上的周向弹性密封元件朝着密封框架的上侧倾斜地延伸到中心开口中。密封元件在无负载的情况下具有比光掩模的外周窄的内周,并且在负载的情况下在中心开口中周向接触光掩模。

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