ATOMIC LAYER DEPOSITION EQUIPMENT GAS MODULE, ATOMIC LAYER DEPOSITION EQUIPMENT, AND ATOMIC LAYER DEPOSITION METHOD USING SAME

摘要

An atomic layer deposition equipment gas module is provided. An atomic layer deposition equipment gas module according to an embodiment of the present invention may comprise: a first gas module having a source gas supply portion for providing source gas toward a substrate and a first purge gas supply portion for providing purge gas toward the substrate; and a second gas module having a reaction gas supply portion positioned in the direction of transfer of the substrate with regard to the first gas module so as to provide reaction gas toward the substrate and a second purge gas supply portion for providing purge gas toward the substrate.