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COATING PROCESS METHOD, COMPUTER STORAGE MEDIUM, AND COATING PROCESS DEVICE

机译:涂覆工艺方法,计算机存储介质和涂覆工艺设备

摘要

A method for coating a coating liquid onto a substrate is provided, wherein said method comprises: supplying, before a liquid film of coating liquid formed on the substrate becomes dried, a solvent for the coating liquid to a peripheral portion of the liquid film of the coating liquid on the substrate while the substrate is rotated at a predetermined rotational speed, thereby forming a mixed layer of the coating liquid and the solvent in the peripheral portion; and, thereafter, rotating the substrate at a rotational speed higher than the predetermined rotational speed to move the mixed layer toward the periphery, thereby controlling the film thickness of the coating liquid after drying.
机译:提供了一种在基板上涂布涂布液的方法,其中所述方法包括:在形成于基板上的涂布液的液膜变干之前,将用于涂布液的溶剂供给至基板的液膜的周边部分。在以预定旋转速度旋转基板的同时在基板上涂布液体,从而在周边部分形成涂布液和溶剂的混合层。然后,以高于预定转速的转速旋转基板,以使混合层向周围移动,从而控制干燥后的涂布液的膜厚。

著录项

  • 公开/公告号WO2018116745A1

    专利类型

  • 公开/公告日2018-06-28

    原文格式PDF

  • 申请/专利权人 TOKYO ELECTRON LIMITED;

    申请/专利号WO2017JP42266

  • 申请日2017-11-24

  • 分类号H01L21/027;B05C11/08;B05D1/36;B05D1/40;B05D3;

  • 国家 WO

  • 入库时间 2022-08-21 12:43:35

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