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Coating processing device, coating processing method and computer storage medium

机译:涂层处理装置,涂层处理方法和计算机存储介质

摘要

A coating processing apparatus for applying a coating liquid containing an optical material to a substrate, comprising: a holding portion for holding a substrate, a coating nozzle for discharging the coating liquid to a substrate held in the holding portion, the holding portion and the coating It has a moving mechanism for relatively moving the nozzle in an orthogonal direction, and a liquid receiving portion which is provided on both sides of the outside of the substrate held in the holding portion and receives the coating liquid discharged from the coating nozzle.
机译:一种用于将包含光学材料的涂布液涂布到基板上的涂布处理装置,包括:用于保持基板的保持部;用于将涂布液排出到保持在该保持部中的基板的涂布喷嘴;所述保持部和所述涂层。它具有用于使喷嘴在正交方向上相对移动的移动机构,以及液体接收部分,该液体接收部分设置在被保持在保持部分中的基板的外侧的两侧上,并接收从涂布喷嘴排出的涂布液。

著录项

  • 公开/公告号KR20200035974A

    专利类型

  • 公开/公告日2020-04-06

    原文格式PDF

  • 申请/专利权人 도쿄엘렉트론가부시키가이샤;

    申请/专利号KR20207004602

  • 发明设计人 니시무라 노리히코;

    申请日2018-07-13

  • 分类号B05C11/10;B05C13/02;B05C5/02;B05D1/26;B05D5/06;G02B5/30;

  • 国家 KR

  • 入库时间 2022-08-21 11:07:29

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