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METHOD TO IMPROVE FILM QUALITY FOR PVD CARBON WITH REACTIVE GAS AND BIAS POWER
METHOD TO IMPROVE FILM QUALITY FOR PVD CARBON WITH REACTIVE GAS AND BIAS POWER
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机译:利用反应气和偏压功率提高PVD碳膜质量的方法
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摘要
Embodiments of the present disclosure generally describe methods for depositing an amorphous carbon layer onto a substrate, including over previously formed layers on the substrate, using a high power impulse magnetron sputtering (HiPIMS) process, and in particular, biasing of the substrate during the deposition process and flowing a nitrogen source gas and/or a hydrogen source gas into the processing chamber in addition to an inert gas to improve the morphology and film stress of the deposited amorphous carbon layer.
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