Method to Improve Film Quality for PVD Carbon Using Reactive Gas and Bias Power

摘要

Embodiments of the present disclosure generally use a high power impulse magnetron sputtering (HiPIMS) process to improve the morphology and film stress of the deposited amorphous carbon layer, and in particular, bias the substrate during the deposition process, and Methods are described for depositing an amorphous carbon layer on a substrate, including over layers previously formed on the substrate, flowing in addition to the gas a nitrogen source gas and/or a hydrogen source gas into a processing chamber.