- - PHOTOACID-GENERATING COMPOUND POLYMER DERIVED THEREFROM PHOTORESIST COMPOSITION INCLUDING THE PHOTOACID-GENERATING COMPOUND OR POLYMER AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE

摘要

A photoacid-generating compound has a mechanism shown in chemical formula. In the chemical formula, R^1, R^2, R^3, R^4, Q, and X are the same as defined in the present specification. The photoacid-generating compound can be used as a component in photoresist compositions, or a monomer introduced to a polymer useful in the photoresist composition. The photoacid-generating compound can achieve desirable balance in solubility and line-width intensity of illumination.