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Manufacturing method of IPS type TFT-LCD array substrate and IPS type TFT-LCD array substrate
Manufacturing method of IPS type TFT-LCD array substrate and IPS type TFT-LCD array substrate
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机译:ips型tft-lcd阵列基板的制造方法和ips型tft-lcd阵列基板
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摘要
The pixel electrode 17 and the common electrode 18 are fabricated using the same transparent conductive layer and the pixel electrode 17 and the insulating protective layer A plurality of mutually parallel tripped channels 162 are provided on the channel 162 and the pixel electrode 17 and the common electrode 18 are distributed along the protruding ends on both sides of the channel 162, 162 to increase the area in the direction perpendicular to the substrate of the pixel electrode 17 and the common electrode 18, to increase the horizontal electric field, and at the same time to increase the storage capacitance, .
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