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Manufacturing method of IPS type TFT-LCD array substrate and IPS type TFT-LCD array substrate

机译:ips型tft-lcd阵列基板的制造方法和ips型tft-lcd阵列基板

摘要

The pixel electrode 17 and the common electrode 18 are fabricated using the same transparent conductive layer and the pixel electrode 17 and the insulating protective layer A plurality of mutually parallel tripped channels 162 are provided on the channel 162 and the pixel electrode 17 and the common electrode 18 are distributed along the protruding ends on both sides of the channel 162, 162 to increase the area in the direction perpendicular to the substrate of the pixel electrode 17 and the common electrode 18, to increase the horizontal electric field, and at the same time to increase the storage capacitance, .
机译:使用相同的透明导电层以及像素电极17和绝缘保护层来制造像素电极17和公共电极18。在沟道162上设置有多个相互平行的跳闸沟道162,并且像素电极17和公共电极如图18所示,沿着沟道162、162的两侧上的突出端分布,以增加在垂直于像素电极17和公共电极18的基板的方向上的面积,以增加水平电场,并且同时增加存储电容。

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