Manufacturing method of AFM cantilever and the AFM cantilever

摘要

The present invention relates to a method of manufacturing a cantilever for an atomic force microscope (AFM), capable of facilitating adjustment of a tilt of a probe. The method includes: a first step of respectively forming a first upper protective film and a first lower protective film on an upper portion of a second silicon layer and a lower portion of a first silicon layer of a silicon-on-insulator (SOI) substrate in which the first silicon layer, an insulating film, and the second silicon layer are sequentially laminated; a second step of forming a first pattern for controlling a thickness of a cantilever arm on the first upper protective film; a third step of forming a first etching region in the first pattern on the second silicon layer by the thickness of the cantilever arm; a fourth step of forming a second pattern for forming an upper tilt of a probe on the first upper protective film on which the first pattern is formed; and a fifth step of forming a cantilever arm region in a second pattern region by removing the second silicon layer in the second pattern until an upper surface of the insulating film is exposed based on the first etching region in the third step such that the second silicon layer remains by the thickness of the cantilever arm, and forming the upper tilt of the probe.