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PRECURSOR COMPOSITION FOR FORMING AMORPHOUS METAL OXIDE SEMICONDUCTOR LAYER AMORPHOUS METAL OXIDE SEMICONDUCTOR LAYER METHOD FOR PRODUCING SAME AND SEMICONDUCTOR DEVICE
PRECURSOR COMPOSITION FOR FORMING AMORPHOUS METAL OXIDE SEMICONDUCTOR LAYER AMORPHOUS METAL OXIDE SEMICONDUCTOR LAYER METHOD FOR PRODUCING SAME AND SEMICONDUCTOR DEVICE
A precursor composition for forming an amorphous metal oxide semiconductor layer containing a metal salt, a first amide and a solvent composed mainly of water is prepared and used to prepare an amorphous metal oxide semiconductor layer.
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