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Roll to roll patterning system and patterning method using the same
Roll to roll patterning system and patterning method using the same
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机译:卷对卷构图系统及使用该系统的构图方法
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摘要
The present invention relates to a roll unit capable of continuously winding a base material layer having a corneal epithelium from one side and winding it from the other side; A resist forming unit for forming an etch resist pattern and a mark pattern having a plurality of steps on the base substrate layer moved by the roll unit; An etching unit for etching the corneal epitaxy using the etch resist pattern; An etching unit for etching the etch resist pattern and the mark pattern; And a measuring unit arranged at least on one side of the ashing unit to measure a shape of the mark pattern, and a patterning method using the roll-to-roll patterning system.
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