CF4 Plasma system for treatment of semiconductor waste gas CF4

摘要

The present invention relates to a plasma system for treatment of semiconductor waste gas CF_4, and more specifically, to a compact plasma system for treatment of semiconductor waste gas CF_4 including a plasma torch, a reaction furnace, a waste gas supply device, a neutralization solution spray tank, an ID fan, etc., to use high heat energy of plasma to quickly and safely decompose and detoxify waste gas CF_4 produced during semiconductor manufacturing processes. According to the present invention, the plasma system for treatment of semiconductor waste gas CF_4 comprises: a plasma torch to use N2 as plasma gas to treat CF_4 produced during semiconductor manufacturing processes; a reaction furnace in which a chemical reaction for waste gas treatment occurs; a waste gas feeding device to feed waste gas into the reaction furnace from the outside; a spray tank storing a neutralization solution to remove harmful components contained in treated exhaust gas; an exhaust gas duct through which exhaust gas is discharged to the outside; and an ID fan and chimney to discharge exhaust gas to the outside.