Feedforward and the control of feedback technique in-situ process

摘要

In polishing substrate in the first pressing plate and before the second time, the first sequence of values obtains the first substrate of first area and the value of the second sequence obtains the substrate and in-situ monitoring system of different second areas. First function, when being suitble to the value obtained before a part of First ray, the second function is suitble to the second time of numerical value obtained before a part of second sequence. Airtight petite person's burnishing parameters are adjusted, and cooperate function based on the first fitting function and second to reduce the region of expected difference. The second substrate, in the first polishing platen using the burnishing parameters calculating adjusted based on the first fitting function and the second installation function.