Method for restoring coating layer of semiconductor process equipment component and semiconductor process equipment component thereof

摘要

In the present invention, there is provided a method for regenerating parts of a semiconductor process equipment, which can reduce material and cost by removing only contaminants accumulating in semiconductor process equipment parts and a part of the upper part of the coating layer and preserving the undamaged coating layer, Equipment components are disclosed.As an example, a base material; A coating layer formed to cover a surface of the base material; And a step of preparing a process equipment part including a contaminated layer stacked on a coating layer; A preservation layer preserving step of removing only the contaminant layer and a part of the coating layer under the contaminant layer to preserve the preservation layer; And a restoration layer forming step of forming a restoration layer on the storage layer.