首页> 外国专利> MAGNETIC TUNNEL JUNCTION WITH PERPENDICULAR ANISOTROPY AND MINIMISED VARIABILITY, MEMORY POINT AND LOGIC ELEMENT COMPRISING THE MAGNETIC TUNNEL JUNCTION, METHOD FOR MANUFACTURING THE MAGNETIC TUNNEL JUNCTION

MAGNETIC TUNNEL JUNCTION WITH PERPENDICULAR ANISOTROPY AND MINIMISED VARIABILITY, MEMORY POINT AND LOGIC ELEMENT COMPRISING THE MAGNETIC TUNNEL JUNCTION, METHOD FOR MANUFACTURING THE MAGNETIC TUNNEL JUNCTION

机译:具有各向异性和可变性最小的磁隧道结,包含磁隧道结的记忆点和逻辑元素,制造磁隧道结的方法

摘要

Magnetic tunnel junction with out-of-plane magnetization comprising: - A storage layer - A reference layer - A tunnel barrier layer The two magnetization states of the storage layer being separated by an energy barrier, said magnetic tunnel junction having a thermal stability factor depending on the energy barrier and the temperature of use of the magnetic tunnel junction, said magnetic tunnel junction being characterized in that: the storage layer has a thickness between 0.5 times and 8 times a characteristic dimension of a planar section of the tunnel junction - the composition and thickness of the storage layer are chosen so that the absolute value of the derivative of the thermal stability factor with respect to a characteristic dimension of a Planar section of the tunnel junction is less than 10nm. SOT type memory point including the magnetic tunnel junction ettique.Process of manufacturing the magnetic tunnel junction, the choice of the composition and the thickness of the storage layer based on optimal magnetization and thickness calculations.
机译:具有平面外磁化的磁性隧道结,包括:-存储层-参考层-隧道势垒层存储层的两个磁化状态被能垒隔开,所述磁隧道结的热稳定性因数取决于在能量屏障和磁性隧道结的使用温度方面,所述磁性隧道结的特征在于:存储层的厚度为隧道结的平面部分的特征尺寸的0.5倍至8倍之间。选择存储层的厚度和厚度,使得热稳定性因子的导数相对于隧道结的平面截面的特征尺寸的绝对值小于10nm。 SOT型存储点,包括磁性隧道结亮粉。基于最佳磁化强度和厚度计算,制造磁性隧道结的过程,成分的选择和存储层的厚度。

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