ALIGNMENT METHOD AND ALIGNMENT DEVICE, AND VACUUM VAPOR DEPOSITION METHOD AND VACUUM VAPOR DEPOSITION DEVICE INCLUDING THE SAME

摘要

To improve precision of position alignment between a substrate and a mask more.SOLUTION: An alignment method includes the processes of: photographing an alignment mark by optical means to obtain image data; and comparing the obtained image data with a model image to detect the position of the alignment mark. The alignment method comprises: detecting, when a focus value of the image data obtained in the process of obtaining the image data is within a predetermined range including a peak value, the position of the alignment mark in the position detecting process through real image processing in which the obtained image data is compared with a first model image obtained through photography of the alignment mark in advance; and detecting, when the focus value deviates from the predetermined range, the position of the alignment mark in the position detecting process through artificial image processing in which the obtained image data is compared with a second model image generated based upon design data on the alignment.SELECTED DRAWING: Figure 10