首页> 外国专利> 部分めっき方法

部分めっき方法

机译:分镀法

摘要

To provide a method for partial plating, when forming a plating film on a small area in a band plate-shaped strip material continuously conveyed along the longitudinal direction, capable for forming a plating film with a sufficient positional accuracy having a relatively uniform thickness without lowering the transport speed of the strip material or elongating the conveyance route.SOLUTION: A partial plating method includes: formation of a positive resist such as an alkali stripping type electrodepositing resist coating on a surface of a base material; formation of an opening which penetrates through the electrodepositing resist coating by removing a predetermined portion of the electrodepositing resist coating with a laser processing machine such as YVOlaser marker having a wavelength of 300 to 1200 nm; and peeling the electrodepositing resist coating by making it dissolved in an alkaline solution after forming a plating film on the opening of the electrodepositing resist coating.SELECTED DRAWING: Figure 1
机译:为了提供一种局部镀覆的方法,当在沿长度方向连续输送的带状板状带材中在较小的区域上形成镀膜时,能够形成不会降低厚度,且具有相对均匀的厚度的足够的位置精度的镀膜。解决方案:部分电镀方法包括:在基材表面上形成正性抗蚀剂,例如碱剥离型电沉积抗蚀剂涂层。通过用诸如YVOlaser标记的激光加工机去除波长在300至1200nm的电沉积抗蚀剂涂层的预定部分,形成贯穿电沉积抗蚀剂涂层的开口;在电沉积抗蚀剂涂层的开口上形成镀膜后,将其溶解在碱性溶液中,然后剥离该电沉积抗蚀剂涂层。图1

著录项

  • 公开/公告号JP2019044262A

    专利类型

  • 公开/公告日2019-03-22

    原文格式PDF

  • 申请/专利权人 DOWA METALTECH KK;

    申请/专利号JP20180138968

  • 申请日2018-07-25

  • 分类号C25D5/02;C25D5/12;C25D13/06;C23C18/18;B23K26/361;B23K26/00;

  • 国家 JP

  • 入库时间 2022-08-21 12:24:05

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号