Shutter device for use in lithography machine exposure and method of using the same

摘要

A shutter device for lithographic machine exposure and a method thereof are provided. The device includes a shutter blade 1, a rotary motor 2 for rotationally driving the shutter blade 1, a controller connected to the rotary motor 2, and a support 3 for supporting the rotary motor 2. The rotary motor 2 rotationally drives the shutter blade 1 to rotate the shutter so that the rotation center 11 is connected to the rotary motor 2 and includes an exposed area and a non-exposed area. Open and close. A hollow portion 131 is provided in the shield 13 to illuminate the mass of the shutter blade 1 during rotation to improve control over the shutter blade 1. By means of the controller, the shutter is opened and closed during the uniform speed state of operation of the shutter blade 1. The acceleration / deceleration process of the shutter blade 1 takes place during the closing state of the shutter, reducing the required torque of the rotary motor 2 and shortening the shutter opening / closing time. [Selected figure] Figure 1