PRODUCTION METHOD OF BARIUM NIOBIUM OXYNITRIDE FILM HAVING SMALL CARRIER DENSITY AND USAGE OF THE SAME

摘要

To provide a barium niobium oxynitride film having a small carrier density.SOLUTION: A method of growing a barium niobium oxynitride film 120 includes a step of (a) growing the barium niobium oxynitride film having a carrier density of 1×10cmon a strontium titanate substrate 110 by a sputtering method. When the barium niobium oxynitride film is irradiated with light, electrons and holes are generated in a conduction band and a valence band of a portion of the barium niobium oxynitride film that has absorbed light. The hole moves to the surface of the barium niobium oxynitride film 120 and is used as a photo semiconductor electrode of a hydrogen generating device.SELECTED DRAWING: Figure 1