Process, reactor and system for the fabrication of free-standing two-dimensional nanostructures using plasma technology

摘要

The present invention relates to processes, reactors and systems for producing free-standing two-dimensional nanostructures using a microwave-excited plasma environment. This process is based on injecting a gas and precursor mixture (9) in a flow state into the reactor. This flow is exposed to an electric field of surface waves (5) excited by the use of microwave power (7) introduced into an electric field applicator (6) that generates a high energy density plasma (2, 3, 4). , Decomposing the precursor into its atomic and / or molecular components. The system includes a plasma reactor having a surface wave firing zone, a transient zone having a gradually increasing cross-sectional area, and a nucleation zone. The plasma reactor along with the infrared radiation source (11) provides a controlled adjustment of the temperature and gas flow velocity spatial gradients. The majority of the resulting two-dimensional nanostructure samples have a single atomic layer thickness, further allowing the process and system to obtain graphene production rates on the order of 1 gram / hour or more. [Selection] Figure 1